Metallic nanomesh for high-performance transparent electromagnetic shielding
Zhuocheng Liang, Zeyu Zhao, Mingbo Pu, Jun Luo, Xin Xie, Yanqing Wang, Yinghui Guo, Xiaoliang Ma, Xiangang Luo
Abstract
This paper reports a high-performance transparent electromagnetic shielding material based on an ultrathin and large-area metallic nanomesh, which was fabricated by a facile and rational process utilizing ultraviolet lithography and the ion beam etching technique. Measurements reveal that a single-layer metallic nanomesh can harvest excellent shielding effectiveness exceeding 40 dB in the wide frequency range from 500 MHz to 40 GHz. Besides, efficient light transmittance (85% at 550 nm) is achieved in both visible and near-infrared regions. Furthermore, the proposed structure remains excellent performance at wide incident angles even up to 50°. Hence, it is believed that this metallic nanomesh with easy fabrication can be a potential alternative in the transparent electromagnetic shielding domain.