Suppression of the redox reaction between the IGZO surface and the reducing agent TMA using fluorine oxidizing agent treatment
Yuseong Jang, Jin-Kyu Lee, Jinsung Mok, Junhyeong Park, Seung Yoon Shin, Soo‐Yeon Lee
Abstract
process, the chemical reduction reaction of the IGZO surface was effectively alleviated, resulting in a defect-passivated and sharp interface owing to the strong oxidizing nature of the fluorine.
Topics & Concepts
Oxidizing agentReducing agentRedoxChemistryOxygenFluorineDeposition (geology)Combinatorial chemistryInorganic chemistryMolecular oxygenChemical engineeringPhotochemistryOrganic chemistrySedimentPaleontologyEngineeringBiologySemiconductor materials and devicesZnO doping and propertiesCatalytic Processes in Materials Science