The effect of stress on HfO2-based ferroelectric thin films: A review of recent advances
Runhao Han, Peizhen Hong, Shuai Ning, Qiang Xü, Mingkai Bai, Jing Zhou, Kaiyi Li, Fei Liu, Feng Shi, Feng Luo, Zongliang Huo
Topics & Concepts
FerroelectricityMaterials scienceStress (linguistics)Thin filmEngineering physicsNanotechnologyOptoelectronicsDielectricPhysicsPhilosophyLinguisticsFerroelectric and Negative Capacitance DevicesMXene and MAX Phase MaterialsSemiconductor materials and devices