Effects of hydrogen plasma treatment on the physical and chemical properties of tin oxide thin films for ambipolar thin-film transistor applications
Kang-Hwan Bae, Seung-Hyun Lim, Kie Yatsu, Ick-Joon Park, Hyuck‐In Kwon
Topics & Concepts
Ambipolar diffusionMaterials scienceThin-film transistorThin filmOptoelectronicsOxideTin oxideNanotechnologyPlasmaTransistorDopingLayer (electronics)VoltageElectrical engineeringMetallurgyPhysicsQuantum mechanicsEngineeringThin-Film Transistor TechnologiesZnO doping and propertiesNanowire Synthesis and Applications