A multi-ion plasma FIB study: Determining ion implantation depths of Xe, N, O and Ar in tungsten via atom probe tomography
Katja Eder, Vijay Bhatia, Jiangtao Qu, Brandon Van Leer, Mikhail Dutka, Julie M. Cairney
Topics & Concepts
Ion implantationTungstenIonArgonAtom probeXenonMaterials scienceAcceleration voltageAnalytical Chemistry (journal)Ion beamPlasmaAtom (system on chip)Atomic physicsMicrostructureChemistryMetallurgyPhysicsQuantum mechanicsComputer scienceElectronEmbedded systemChromatographyOrganic chemistryCathode rayAdvanced Materials Characterization TechniquesMetal and Thin Film MechanicsFusion materials and technologies