Rayleigh or Abbe? Origin and naming of the resolution formula of microlithography
Anthony Yen
Abstract
We review the history in connection with the resolution formula of microlithography and argue that it was Abbe rather than Rayleigh who definitively stated the 0.5λNA resolution limit for the minimum pitch first, using an approach more relevant to projection imaging, and hence, this expression should be more appropriately referred to as the Abbe formula for the resolution of a projection imaging system.
Topics & Concepts
Resolution (logic)Projection (relational algebra)Limit (mathematics)Expression (computer science)Connection (principal bundle)OpticsRayleigh scatteringPhysicsMathematicsComputer scienceGeometryMathematical analysisAlgorithmArtificial intelligenceProgramming languageAdvancements in Photolithography TechniquesElectron and X-Ray Spectroscopy TechniquesIntegrated Circuits and Semiconductor Failure Analysis