Litcius/Paper detail

Investigation of N + SiGe Gate Stacked V-TFET Based on Dopingless Charge Plasma for Gas Sensing Application

Shailendra Singh, Archana Verma, Jeetendra Singh, Girish Wadhwa

2021Silicon24 citationsDOI

Topics & Concepts

Materials scienceGate oxideOptoelectronicsWork functionGate dielectricDopingDielectricMetal gateAnalytical Chemistry (journal)NanotechnologyElectrical engineeringVoltageTransistorLayer (electronics)ChromatographyEngineeringChemistryAdvancements in Semiconductor Devices and Circuit DesignSemiconductor materials and devicesNanowire Synthesis and Applications