Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates
A. Hrubantová, R. Hippler, H. Wulff, Martin Čada, J. Olejníček, N. Nepomniashchaia, Christiane A. Helm, Zdeněk Hubička
Abstract
Tungsten oxide films are deposited with the help of reactive magnetron sputtering in an argon/oxygen gas mixture. Films are deposited on different substrates, in particular, on soda lime glass, fluorine-doped tin oxide coated glass, silicon (Si), and quartz (SiO2). Thin films from three different discharge modes, in particular, high power impulse magnetron sputtering, midfrequency magnetron sputtering, and radiofrequency magnetron sputtering, are compared. Deposited films are characterized by x-ray diffraction, Raman spectroscopy, and spectroscopic ellipsometry. Composition, crystal structure, and optical properties of as-deposited and annealed films are found to depend on the deposition mode and on the substrate.