Additive-Free EDA Photochemical Arylative Trifluoromethylation of Enamides with Trifluoromethyl Benzothiazole Sulfones
Rui Lv, Lujun Lou, Tianshuai Zhu, Jing‐Jing Zhang, Guangwei Wu, Mengyang Hu, Lijun Tang, Zhen Chen
Abstract
An additive-free trifluoromethylation–heteroarylation of enamides with trifluoromethyl heteroaryl sulfones via EDA photochemistry is reported. Under visible-light irradiation, diverse enamides and sulfones undergo efficient difunctionalization to afford CF 3 -heteroaryl amides in moderate to excellent yields, without the need for photocatalysts or additives. Mechanistic studies support the formation of a photoexcited EDA complex that triggers C–S bond cleavage, generating CF 3 and heteroaryl anions. This work provides a sustainable approach to alkene arylative difunctionalization and expands the utility of aryl sulfones in constructing CF 3 -containing scaffolds.