Impact of interface trap charges on electrical performance characteristics of a source pocket engineered Ge/Si heterojunction vertical TFET with HfO2/Al2O3 laterally stacked gate oxide
Manas Ranjan Tripathy, A Samad, Ashish Kumar Singh, Prince Kumar Singh, Kamalaksha Baral, Ashwini Kumar Mishra, Satyabrata Jit
Topics & Concepts
Materials scienceTransconductanceOptoelectronicsHeterojunctionTransistorElectrical engineeringVoltageEngineeringAdvancements in Semiconductor Devices and Circuit DesignSemiconductor materials and devicesNanowire Synthesis and Applications