Hybrid alkyl-ligand tin-oxo clusters for enhanced lithographic patterning performance <i>via</i> intramolecular interactions
Hao Chen, Wenzheng Li, Yingdong Zhao, Xinyan Huang, Jialong Zhang, Peijun Ji, Jun Zhao, Pengzhong Chen, Xiaojun Peng
Abstract
Tin-oxo clusters (TOCs) are promising candidates for next-generation extreme ultraviolet (EUV) photoresist materials due to their strong EUV absorption properties and small molecular sizes.
Topics & Concepts
Intramolecular forceAlkylLigand (biochemistry)TinMaterials scienceLithographyChemistryNanotechnologyCombinatorial chemistryOptoelectronicsStereochemistryOrganic chemistryReceptorBiochemistryAdvancements in Photolithography TechniquesNanofabrication and Lithography TechniquesBlock Copolymer Self-Assembly