Plasma-enhanced atomic layer deposited HfO2 films using a novel heteroleptic cyclopentadienyl-based Hf precursor
Ji-hoon Baek, Wan-Ho Choi, Hohoon Kim, Seonghak Cheon, Younghun Byun, Woojin Jeon, Jin‐Seong Park
Topics & Concepts
Atomic layer depositionMaterials scienceCrystallinityMonoclinic crystal systemDeposition (geology)Layer (electronics)Analytical Chemistry (journal)Thin filmChemical engineeringNanotechnologyCrystallographyComposite materialCrystal structureChemistryOrganic chemistryEngineeringBiologySedimentPaleontologySemiconductor materials and devicesFerroelectric and Negative Capacitance DevicesAdvancements in Semiconductor Devices and Circuit Design