Area-selective atomic layer deposition (AS-ALD) of low temperature (300 °C) cobalt thin film using octadecyltrichlorosilane (ODTS) self-assembled monolayers (SAMs)
Chaewon Kim, Moonsuk Choi, Ji-Hyun Sim, Hyung-jun Kim, Changhwan Choi, Changhwan Choi
Topics & Concepts
OctadecyltrichlorosilaneAtomic layer depositionMonolayerSelf-assembled monolayerMaterials scienceCobaltLayer (electronics)NanotechnologyDeposition (geology)Thin filmChemical engineeringSelf-assemblyMetallurgyEngineeringBiologySedimentPaleontologySemiconductor materials and devicesMolecular Junctions and NanostructuresCopper Interconnects and Reliability