Atomic layer deposition of titanium oxide thin films using a titanium precursor with a linked amido-cyclopentadienyl ligand
Seongyoon Kim, Romel Hidayat, Hyeonsu Roh, Jaemin Kim, Hye-Lee Kim, Khabib Khumaini, Mira Park, Jang-Hyeon Seok, Jung‐Woo Park, Won‐Jun Lee
Abstract
We studied the atomic layer deposition (ALD) of titanium oxide (TiO 2 ) thin films using a newly developed heteroleptic titanium precursor with a linked ligand.
Topics & Concepts
Cyclopentadienyl complexMaterials scienceTitaniumAtomic layer depositionLayer (electronics)Ligand (biochemistry)Titanium oxideDeposition (geology)OxideInorganic chemistryThin filmChemical engineeringMetallurgyNanotechnologyOrganic chemistryCatalysisChemistryReceptorBiochemistryPaleontologySedimentBiologyEngineeringSemiconductor materials and devicesCatalytic Processes in Materials ScienceElectronic and Structural Properties of Oxides