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1 W/mm Output Power Density for H-Terminated Diamond MOSFETs With Al<sub>2</sub>O<sub>3</sub>/SiO<sub>2</sub>Bi-Layer Passivation at 2 GHz

Xinxin Yu, Wenxiao Hu, Jianjun Zhou, Bin Liu, Tao Tao, Yuechan Kong, Tangsheng Chen, Youdou Zheng

2020IEEE Journal of the Electron Devices Society22 citationsDOIOpen Access PDF

Abstract

We have demonstrated a novel method of depositing ALD-Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> /PECVD-SiO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> bi-layer dielectric to passive the surface channels of the hydrogen-terminated diamond (H-diamond). After Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> /SiO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> passivation, the surface current increased with time and then tended to be saturated. Afterwards, it became much more stable and showed a larger current than an unpassivated counterpart. The H-diamond MOSFETs were fabricated by using this bi-layer passivation structure and an extremely low Ohmic contact resistance of 0.87 Ω·mm was obtained. The H-diamond RF MOSFET with gate length of 0.45 μm achieved a high current density of -549 mA/mm and an extrinsic fT/fmax of 15/36 GHz. By load-pull measurement, a high output power density of 1.04 W/mm was obtained at frequency of 2 GHz. The results reveal that it is a promising solution for high-stable and high-power diamond transistors by using the Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> /SiO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> bi-layer passivation.

Topics & Concepts

PassivationDiamondMaterials scienceAnalytical Chemistry (journal)Layer (electronics)PhysicsOptoelectronicsNanotechnologyChemistryOrganic chemistryComposite materialDiamond and Carbon-based Materials ResearchSemiconductor materials and devicesMetal and Thin Film Mechanics
1 W/mm Output Power Density for H-Terminated Diamond MOSFETs With Al<sub>2</sub>O<sub>3</sub>/SiO<sub>2</sub>Bi-Layer Passivation at 2 GHz | Litcius