Litcius/Paper detail

Chemical mechanical polishing on cobalt-based barrier through dual functionality of salicylhydroxamic acid between the removal of copper and corrosion inhibition

Yingqi Di, Guofeng Pan, Song Lv, Liunan She, Le Zhai, Yuhang Qi

2025Electrochimica Acta11 citationsDOI

Topics & Concepts

Salicylhydroxamic acidCopperCobaltChemical-mechanical planarizationCorrosionPolishingMetallurgyChemistryErosion corrosion of copper water tubesCorrosion inhibitorMaterials scienceBiochemistryEnzymeCorrosion Behavior and InhibitionMetal Extraction and BioleachingAdvanced Surface Polishing Techniques