Deposition of cobalt oxide films by reactive pulsed magnetron sputtering
R. Hippler, Martin Čada, P. Kšírová, J. Olejníček, P. Jiřı́ček, J. Houdková, H. Wulff, Angela Kruth, Christiane A. Helm, Zdeněk Hubička
Topics & Concepts
High-power impulse magnetron sputteringMaterials scienceAnalytical Chemistry (journal)Sputter depositionX-ray photoelectron spectroscopyArgonSputteringSpinelThin filmScanning electron microscopeCavity magnetronNuclear magnetic resonanceNanotechnologyComposite materialMetallurgyChemistryPhysicsOrganic chemistryChromatographyZnO doping and propertiesMetal and Thin Film MechanicsSemiconductor materials and devices