Effect of hydrofluorocarbon structure of C3H2F6 isomers on high aspect ratio etching of silicon oxide
Hyun Woo Tak, Hye Joo Lee, Long Wen, Byung Jin Kang, Dain Sung, Jeong Woon Bae, Dong Woo Kim, Won‐Seok Lee, Seung Bae Lee, Keunsuk Kim, Byeong Ok Cho, Young Lea Kim, Han Song, Geun Young Yeom
Topics & Concepts
ChemistryFluorocarbonChemical compositionOxideOxygenLayer (electronics)Etching (microfabrication)SiliconSilicon oxideIsotropic etchingAmorphous solidAnalytical Chemistry (journal)PlasmaIonChemical structureCarbon fibersChemical engineeringOrganic chemistryMaterials scienceComposite materialPhysicsSilicon nitrideComposite numberEngineeringQuantum mechanicsPlasma Diagnostics and ApplicationsCopper Interconnects and ReliabilityMetal and Thin Film Mechanics