Evaluation of the chemical states and electrical activation of ultra-highly B-doped Si1-xGex by ion implantation and subsequent nanosecond laser annealing
Kiseok Lee, Chunghee Jo, Dongmin Yoon, Seunghyun Baik, Dae-Hong Ko
Topics & Concepts
Materials scienceX-ray photoelectron spectroscopyDopingAnalytical Chemistry (journal)DopantAnnealing (glass)Chemical stateDopant ActivationSiliconOptoelectronicsChemistryNuclear magnetic resonanceComposite materialChromatographyPhysicsSemiconductor materials and devicesIntegrated Circuits and Semiconductor Failure AnalysisIon-surface interactions and analysis