Polishing of diamond, SiC, GaN based on the oxidation modification of hydroxyl radical: Status, challenges and strategies
Dong Shi, Wei Zhou, Tianchen Zhao
Topics & Concepts
PolishingDiamondMaterials scienceChemical-mechanical planarizationSlurrySemiconductorYield (engineering)BrittlenessChemical engineeringNanotechnologyMetallurgyOptoelectronicsComposite materialEngineeringDiamond and Carbon-based Materials ResearchAdvanced Surface Polishing TechniquesSemiconductor materials and devices