Effects of post cooling on the remnant polarization and coercive field characteristics of atomic layer deposited Al-doped HfO2 thin films
Bon‐Cheol Ku, Yu‐Rim Jeon, Moonsuk Choi, Chulwon Chung, Changhwan Choi
Topics & Concepts
Materials scienceCoercivityFerroelectricityThin filmDopingPolarization (electrochemistry)Orthorhombic crystal systemAnalytical Chemistry (journal)Composite materialCondensed matter physicsDielectricOptoelectronicsCrystal structureNanotechnologyCrystallographyChemistryPhysicsPhysical chemistryChromatographyFerroelectric and Negative Capacitance DevicesMXene and MAX Phase MaterialsSemiconductor materials and devices