Chemically Amplified Resist Based on Dendritic Molecular Glass for Electron Beam Lithography
Shengwen Hu, Jinping Chen, Tianjun Yu, Yi Zeng, Guoqiang Yang, Yi Li
Topics & Concepts
ResistPhotoresistMaterials scienceElectron-beam lithographyLithographyAmorphous solidOptoelectronicsNanotechnologyOpticsChemistryCrystallographyLayer (electronics)PhysicsAdvancements in Photolithography TechniquesNanofabrication and Lithography TechniquesThin-Film Transistor Technologies