Removal of SiC at atomic and close-to-atomic scale by nanosecond ultraviolet laser
Haojie An, Jinshi Wang, Fengzhou Fang
Topics & Concepts
FluenceMaterials scienceNanosecondAtomic unitsUltravioletLaserExfoliation jointIrradiationSurface modificationAtomic physicsNanotechnologyAnalytical Chemistry (journal)OptoelectronicsOpticsChemistryPhysical chemistryGrapheneChromatographyQuantum mechanicsNuclear physicsPhysicsDiamond and Carbon-based Materials ResearchLaser Material Processing TechniquesAdvanced Surface Polishing Techniques