Litcius/Paper detail

Toward TSV-Compatible Microfluidic Cooling for 3D ICs

Geyu Yan, Euichul Chung, Erik W. Masselink, Shane Oh, Muneeb Zia, Bharath Ramakrishnan, Vaidehi Oruganti, Husam A. Alissa, Christian Belady, Yunhyeok Im, Yogendra Joshi, Muhannad S. Bakir

2024IEEE Transactions on Components Packaging and Manufacturing Technology12 citationsDOI

Abstract

Cooling presents a significant challenge for high-performance 3-D integrated circuits (3D ICs). To this end, this research explores through-silicon via (TSV)-compatible micropin-fin heat sink (MPFHS) for high-power 3-D chip stacks. Copper TSVs with a diameter of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$5.2~\mu $ </tex-math></inline-formula>m and a high aspect ratio (HAR) of 29:1 are developed. An extensive experimental and computational investigation of the MPFHS under varying flow rates and power conditions was conducted, showing that the MPFHS maintains an average chip temperature below <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$72~^{\circ }$ </tex-math></inline-formula>C, even with a total power dissipation of 500 W and a power density of 312 W/cm2 at a flow rate of 117 mL/min. The minimum total thermal resistance achieved was <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$0.286~^{\circ }$ </tex-math></inline-formula>C<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\cdot $ </tex-math></inline-formula>cm2/W.

Topics & Concepts

MicrofluidicsThree-dimensional integrated circuitMaterials scienceIntegrated circuit packagingComputer scienceThermal management of electronic devices and systemsElectronic engineeringOptoelectronicsNanotechnologyMechanical engineeringIntegrated circuitEngineering3D IC and TSV technologiesHeat Transfer and OptimizationNanofabrication and Lithography Techniques