Computational metrology method of collector mirror for EUV lithography
Yunyi Chen, Zexu Liu, Nan Lin
Topics & Concepts
Extreme ultraviolet lithographyMetrologyLithographyOpticsMaterials scienceOptoelectronicsPhysicsAdvancements in Photolithography TechniquesSurface Roughness and Optical MeasurementsAdvanced Surface Polishing Techniques