Electrical characteristics of atomic layer deposited Au/Ti/HfO2/n-GaAs MIS diodes in the wide temperature range
A. Türüt, Dilber Esra Yıldız, Abdulkerim Karabulut, İkram Orak
Topics & Concepts
Materials scienceDiodeAtmospheric temperature rangeAtomic layer depositionAnalytical Chemistry (journal)Equivalent series resistanceCapacitanceOptoelectronicsThin filmVoltageChemistryElectrical engineeringNanotechnologyElectrodeChromatographyPhysicsPhysical chemistryMeteorologyEngineeringSemiconductor materials and devicesSemiconductor materials and interfacesAdvancements in Semiconductor Devices and Circuit Design