State of the art, trends, and opportunities for oxide epitaxy
Felix V. E. Hensling, Wolfgang Braun, Dong Yeong Kim, Lena N. Majer, Sander Smink, Brendan D. Faeth, J. Mannhart
Abstract
Oxides have attracted enormous attention for both application-driven and fundamental solid-state research owing to their broad range of unusual and unique properties. Oxides play an important role in countless applications, e.g., as catalysts or functional materials in electronic devices. The ability to produce high-quality epitaxial films is often crucial for these purposes. Various approaches to oxide epitaxy have been evolving for many years, each of which has its own features and strengths. However, oxide epitaxy also poses numerous challenges, the main ones being (1) the difficulty of finding a universal, versatile, and clean way to transfer an element from a source onto a substrate and (2) the ability to control the phase formation in a growing film. For oxides, this is an especially relevant topic due to the high oxidization potentials needed to achieve many desired compounds, the high temperatures required for numerous oxide phases to form, and the high temperatures necessary to grow films in adsorption-controlled growth modes. We provide a non-exhaustive overview of the state-of-the-art of oxide epitaxy within the context of these challenges. We also examine exciting advances and recent trends to overcome those challenges. Concluding, we discuss the implications of ongoing developments and the future of oxide epitaxy. An emphasis is put on thermal laser epitaxy and CO2 laser heaters, which we deem especially promising.