SnO deposition <i>via</i> water based ALD employing tin(<scp>ii</scp>) formamidinate: precursor characterization and process development
Niklas Huster, Ramin Ghiyasi, David Zanders, Detlef Rogalla, Maarit Karppinen, Anjana Devi
Abstract
UV-Vis spectroscopy, exhibiting a band gap of 2.74 eV, which further confirms the formation of the targeted SnO phase.
Topics & Concepts
Atomic layer depositionTinX-ray photoelectron spectroscopyRutherford backscattering spectrometryTin oxideNuclear reaction analysisChemistryThermal stabilityAnalytical Chemistry (journal)Chemical engineeringMaterials scienceNanotechnologyThin filmOxideHydrogenOrganic chemistryEngineeringZnO doping and propertiesCatalytic Processes in Materials ScienceSemiconductor materials and devices