Effect of Y concentration and film thickness on microstructure and electrical properties of HfO2 based thin films
Hailong Liang, Bo Zhang, Dayu Zhou, Xintai Guo, Yan Li, Yanqing Lu, Yuanyuan Guo
Topics & Concepts
Materials scienceDielectricThin filmMicrostructureDopingBand gapYttriumPermittivityOptoelectronicsOxideAnalytical Chemistry (journal)Composite materialNanotechnologyMetallurgyChemistryChromatographySemiconductor materials and devicesAdvancements in Semiconductor Devices and Circuit DesignFerroelectric and Negative Capacitance Devices