Litcius/Paper detail

Prediction of material removal rate in chemical mechanical polishing via residual convolutional neural network

Jiusi Zhang, Yuchen Jiang, Hao Luo, Shen Yin

2020Control Engineering Practice86 citationsDOI

Topics & Concepts

Chemical-mechanical planarizationConvolutional neural networkResidualArtificial neural networkComputer scienceMachiningProcess (computing)PolishingArtificial intelligenceMachine learningProcess engineeringEngineeringAlgorithmMechanical engineeringOperating systemAdvanced Surface Polishing TechniquesAdvanced machining processes and optimizationManufacturing Process and Optimization
Prediction of material removal rate in chemical mechanical polishing via residual convolutional neural network | Litcius