Sputter yield measurements to evaluate the target state during reactive magnetron sputtering
R. Schelfhout, Koen Strijckmans, Diederik Depla
Topics & Concepts
SputteringOxygenYield (engineering)ArgonAnalytical Chemistry (journal)OxideSputter depositionMaterials scienceHigh-power impulse magnetron sputteringChemistryMetallurgyThin filmNanotechnologyChromatographyOrganic chemistryMetal and Thin Film MechanicsSemiconductor materials and devicesIon-surface interactions and analysis