Structure and Characterization of Vacuum Arc Deposited Carbon Films—A Critical Overview
B. Schultrich
Abstract
This critical overview analyzes the relations between deposition conditions and structure for hydrogen-free carbon films, prepared by vacuum arc deposition. The manifold of film structures can be roughly divided into graphitic, nanostructured and amorphous films. Their detailed characterization uses advantageously sp3 fraction, density, Raman peak ratio and the mechanical properties (Young’s modulus and hardness). Vacuum arc deposition is based on energetic beams of carbon ions, where the film growth is mainly determined by ion energy and surface temperature. Both parameters can be clearly defined in the case of energy-selected carbon ion deposition, which thus represents a suitable reference method. In the case of vacuum arc deposition, the relation of the external controllable parameters (especially bias voltage and bulk temperature) with the internal growth conditions is more complex, e.g., due to the broad energy distribution, due to the varying “natural” ion energy and due to the surface heating by the ion bombardment. Nevertheless, some general trends of the structural development can be extracted. They are critically discussed and summarized in a hypothetical structural phase diagram in the energy-temperature plane.