Highly efficient and damage-free polishing of GaN (0 0 0 1) by electrochemical etching-enhanced CMP process
Linfeng Zhang, Hui Deng
Topics & Concepts
LappingMaterials scienceEtching (microfabrication)PolishingSurface roughnessSurface finishLayer (electronics)ElectrolyteGrindingChemical-mechanical planarizationElectrochemistryPhotoluminescenceOptoelectronicsNanotechnologyComposite materialChemical engineeringChemistryElectrodePhysical chemistryEngineeringGaN-based semiconductor devices and materialsMetal and Thin Film MechanicsSemiconductor materials and devices