Structural and gas barrier properties of hydrogenated silicon nitride thin films prepared by roll-to-roll microwave plasma-enhanced chemical vapor deposition
Seong‐Keun Cho, Tae‐Yeon Cho, Won Jae Lee, Juwhan Ryu, Jae Heung Lee
Topics & Concepts
Silicon nitridePlasma-enhanced chemical vapor depositionChemical vapor depositionMaterials scienceSilicon oxynitrideSiliconChemical engineeringDiffusion barrierAmorphous solidWater vaporAnalytical Chemistry (journal)Layer (electronics)Composite materialNanotechnologyChemistryOptoelectronicsOrganic chemistryEngineeringThin-Film Transistor TechnologiesSemiconductor materials and devicesCopper Interconnects and Reliability