Ultimate suppression of thermal transport in amorphous silicon nitride by phononic nanostructure
Naoki Tambo, Yuxuan Liao, Chun Zhou, Elizabeth Michiko Ashley, Kouhei Takahashi, Paul F. Nealey, Y. Naito, Junichiro Shiomi
Abstract
A combination of the phonon-gas kinetics model and the Allen-Feldmann theory reproduced the measured results without any fitting parameters. The thermal conductivity reduction was explained as extremely strong diffusive boundary scattering of both propagons and diffusons. These findings give rise to substantial tunability of thermal conductivity of amorphous materials, which enables us to provide better thermal solutions in microelectronic devices.
Topics & Concepts
Thermal conductivityMaterials scienceAmorphous solidPhononMicroelectronicsNanostructureSilicon nitrideThermalThermal conductionAmorphous siliconSiliconThermal diffusivityNanotechnologyBoltzmann equationOptoelectronicsCondensed matter physicsComposite materialCrystalline siliconThermodynamicsChemistryCrystallographyPhysicsThermal properties of materialsThermal Radiation and Cooling TechnologiesThermography and Photoacoustic Techniques