Evaluation of silicon tetrahalide precursors for low-temperature thermal atomic layer deposition of silicon nitride
Neung-Kyung Yu, Chan Hui Moon, Jeongwoo Park, Han‐Bo‐Ram Lee, Bonggeun Shong
Topics & Concepts
Atomic layer depositionSiliconSilicon nitrideReactivity (psychology)Deposition (geology)EnthalpyNitrideMaterials scienceChemical vapor depositionLayer (electronics)Density functional theoryAtmospheric temperature rangeGibbs free energyChemical engineeringThin filmNanotechnologyChemistryComputational chemistryThermodynamicsOptoelectronicsAlternative medicinePaleontologyPhysicsSedimentEngineeringMedicineBiologyPathologySemiconductor materials and devicesCatalytic Processes in Materials ScienceElectronic and Structural Properties of Oxides