New approach for fabrication of annealing-free ferroelectric HfO2-based films at room temperature
Hailong Liang, Bo Zhang, Yuanyuan Guo, Xintao Guo, Shiqiang Ren, Yan Li, Yanqing Lu, Runlong Lang
Topics & Concepts
Materials scienceFerroelectricityAnnealing (glass)Sputter depositionIon beamCoercivityThin filmOptoelectronicsIonSputteringAnalytical Chemistry (journal)Condensed matter physicsNanotechnologyDielectricComposite materialChromatographyPhysicsQuantum mechanicsChemistryFerroelectric and Negative Capacitance DevicesSemiconductor materials and devicesElectronic and Structural Properties of Oxides