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Synergistic passivation effects of nitrogen plasma and oxygen plasma on improving the interface quality and bias temperature instability of 4H-SiC MOS capacitors

Chao Yang, Zhipeng Yin, Fanglong Zhang, Yan Su, Fuwen Qin, Dejun Wang

2020Applied Surface Science26 citationsDOI

Topics & Concepts

PassivationMaterials scienceX-ray photoelectron spectroscopyAnalytical Chemistry (journal)CapacitorPlasmaElectron cyclotron resonanceOxideAnnealing (glass)ChemistryVoltageComposite materialNuclear magnetic resonanceElectrical engineeringLayer (electronics)MetallurgyEngineeringChromatographyPhysicsQuantum mechanicsSilicon Carbide Semiconductor TechnologiesSemiconductor materials and devicesCopper Interconnects and Reliability
Synergistic passivation effects of nitrogen plasma and oxygen plasma on improving the interface quality and bias temperature instability of 4H-SiC MOS capacitors | Litcius