NiO supported on Y<sub>2</sub>Ti<sub>2</sub>O<sub>7</sub>pyrochlore for CO<sub>2</sub>reforming of CH<sub>4</sub>: insight into the monolayer dispersion threshold effect on coking resistance
Lianghui Xia, Menghe Yang, Shuobin Li, Yan Zhuo, Xiuzhong Fang, Xianglan Xu, Junwei Xu, Zhixian Gao, Xiang Wang
Abstract
An evident monolayer dispersion threshold effect on coking resistance is observed for NiO/Y<sub>2</sub>Ti<sub>2</sub>O<sub>7</sub>catalysts in DRM reaction. A catalyst with the best activity and anti-coking ability can be fabricated at the monolayer dispersion capacity.
Topics & Concepts
MonolayerNon-blocking I/ODispersion (optics)CatalysisPyrochloreMaterials scienceChemical engineeringNanotechnologyChemistryPhysicsOpticsOrganic chemistryPhase (matter)EngineeringCatalysis and Oxidation ReactionsZeolite Catalysis and SynthesisCatalytic Processes in Materials Science