Silicon Clathrate Films for Photovoltaic Applications
Thomas Fix, Romain Vollondat, Arechkik Ameur, Stéphane Roques, Jean‐Luc Rehspringer, Céline Chevalier, D. Müller, A. Slaoui
Abstract
Silicon clathrates are allotropes of silicon that show great promise for optoelectronics and batteries. However, silicon clathrates in the form of films are relatively new, and devices based on this material still have to be engineered. In this work, we present a protocol for silicon clathrate film fabrication that does not necessitate a glovebox. We show that dense films can be obtained with a pressure annealing treatment and the films can be measured by atomic force microscopy. Ion implantation of P, B and As is performed on the clathrate films. Early photovoltaic devices are presented, with a maximum short circuit current density of 0.11 mA/cm2.