High patterning photosensitivity by a novel fluorinated copolymer formulated resist
Yana Guo, Shenshen Li, Haihua Wang, Yu Chen, Huan Chen, Dong Wang, Qianqian Wang, Wenbing Kang, Qianqian Wang, Wenbing Kang
Topics & Concepts
ResistPhotosensitivityCopolymerMaterials scienceNanotechnologyOptoelectronicsPolymerComposite materialLayer (electronics)Advancements in Photolithography TechniquesNanofabrication and Lithography TechniquesOptical Coatings and Gratings