Optimized design of block copolymers with covarying properties for nanolithography
Hongbo Feng, Moshe Dolejsi, Ning Zhu, Soonmin Yim, Whitney S. Loo, Peiyuan Ma, Chun Zhou, Gordon S. W. Craig, Wen Chen, Lei Wan, Ricardo Ruiz, Juan Pablo, Stuart J. Rowan, Paul F. Nealey
Topics & Concepts
NanolithographyBlock (permutation group theory)Materials scienceNanotechnologyLithographyTemplateComputer scienceCopolymerGyroidPolymerOptoelectronicsFabricationPathologyMathematicsMedicineGeometryComposite materialAlternative medicineBlock Copolymer Self-AssemblyAdvanced Polymer Synthesis and CharacterizationMachine Learning in Materials Science