P‐130: 3207‐ppi, 1.50‐in. OLED Microdisplay with All Pixels Formed Through RGB Side‐by‐Side Patterning by Photolithography
Yasumasa Yamane, Nozomu Sugisawa, Daiki Nakamura, Toshiyuki Isa, Hitomi Sato, Daigo Shimada, Toshiki Mizuguchi, Yuki Tamatsukuri, Minato Ito, Kentaro Sugaya, Takahiro Fujie, Yuichi Yanagisawa, Yoshikazu Hiura, Ryota Hodo, Shinya Sasagawa, Hitoshi Kunitake, Shunpei Yamazaki
Abstract
Our method for side‐by‐side OLED layer patterning by photolithographic etching offers devices with properties almost equivalent to those of devices consistently fabricated in vacuum. We fabricate herein a 3207‐ppi 1.50‐in low‐power OLED microdisplay with an ultrahigh aperture ratio and no lateral leakage using this method.
Topics & Concepts
OLEDPhotolithographyMaterials scienceOptoelectronicsEtching (microfabrication)PixelRGB color modelLayer (electronics)OpticsNanotechnologyComputer sciencePhysicsOperating systemThin-Film Transistor TechnologiesPhotonic and Optical DevicesPhotonic Crystals and Applications