Close atomic surface on aluminum alloy achieved by a near-neutral novel green chemical mechanical polishing method with high material removal rate
Xiaofei Lei, Zhenyu Zhang, Hongxiu Zhou, Leilei Chen, Xingqiao Deng, Weiting Liu, Xuye Zhuang, Mengyi Wang, Yang Gu
Abstract
ions and were chelated by niacin and triethanolamine. Consequently, chelating formulas were proposed. Our developed near-neutral green CMP provides a new approach to achieving a close atomic surface for soft and plastic Al alloys with a high MRR.
Topics & Concepts
PolishingSlurryMaterials scienceAlloyAluminiumChemical-mechanical planarizationSurface roughnessMetallurgySurface finishSurface (topology)Composite materialGeometryMathematicsAdvanced Surface Polishing TechniquesMetal and Thin Film MechanicsNanofabrication and Lithography Techniques