Understanding electromigration failure behaviors of narrow cobalt lines and the mechanism of reliability enhancement for extremely dilute alloying of manganese oxide
Jau-Shiung Fang, Giin-Shan Chen, Chin-Chia Chang, Chien-Nan Hsiao, Wei‐Chun Chen, Yi-Lung Cheng
Topics & Concepts
ElectromigrationMaterials scienceMicrostructureInterconnectionAnnealing (glass)Joule heatingCobaltMetallurgyComposite materialOptoelectronicsComputer networkComputer scienceCopper Interconnects and ReliabilityElectronic Packaging and Soldering TechnologiesElectrodeposition and Electroless Coatings