Influence of hydrogen gas flow ratio on the properties of silicon- and nitrogen-doped diamond-like carbon films by plasma-enhanced chemical vapor deposition
Yuya Sasaki, Hiroya Osanai, Yusuke Ohtani, Yuta Murono, Masayoshi Satō, Yasuyuki Kobayashi, Yoshiharu Enta, Yushi Suzuki, Hideki Nakazawa
Topics & Concepts
Materials scienceChemical vapor depositionDangling bondPlasma-enhanced chemical vapor depositionDiamond-like carbonSiliconAnalytical Chemistry (journal)HydrogenCarbon filmAnnealing (glass)DopingCarbon fibersVolumetric flow rateComposite materialThin filmNanotechnologyChemistryComposite numberMetallurgyOptoelectronicsQuantum mechanicsPhysicsChromatographyOrganic chemistryDiamond and Carbon-based Materials ResearchMetal and Thin Film MechanicsForce Microscopy Techniques and Applications