A new type of nanoscale reference grating manufactured by combined laser-focused atomic deposition and x-ray interference lithography and its use for calibrating a scanning electron microscope
Xiao Deng, Gaoliang Dai, Jie Liu, Xiukun Hu, Detlef Bergmann, Jun Zhao, Renzhong Tai, Xiaoyu Cai, Yuan Li, Tongbao Li, Xinbin Cheng
Topics & Concepts
GratingMetrologyNanometrologyOpticsScanning electron microscopeCalibrationLithographyMaterials scienceMagnificationElectron-beam lithographyOptoelectronicsNanotechnologyResistPhysicsLayer (electronics)Quantum mechanicsForce Microscopy Techniques and ApplicationsAdvanced Surface Polishing TechniquesAdvancements in Photolithography Techniques