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Effects of p-GaN Body Doping Concentration on the ON-State Performance of Vertical GaN Trench MOSFETs

Renqiang Zhu, Huaxing Jiang, Chak Wah Tang, Kei May Lau

2021IEEE Electron Device Letters29 citationsDOI

Abstract

In this letter, we report the influence of p-GaN body doping concentration on the ON-state performance of vertical GaN trench MOSFETs. Decreasing the p-GaN body doping concentration leads to an enhanced maximum drain current (I <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">D,max</sub> ), reduced specific ON-resistance (R <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">ON,sp</sub> ), but also a decreased threshold voltage (V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">th</sub> ), suggesting that the p-GaN doping plays an important role in balancing the V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">th</sub> , R <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">ON,sp</sub> and I <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">D,max</sub> in vertical GaN trench MOSFETs. Resulting from the tuning of Mg concentration in the p-GaN, we demonstrate high ON-performance including a high I <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">D,max</sub> of 2.8 kA/cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> , a low R <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">ON,sp</sub> of 0.87 mΩ·cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> , a large V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">th</sub> of 4.8 V in a quasi-vertical GaN trench MOSFET on sapphire with a 2.5- μm-thick drift layer, while maintaining a breakdown voltage of 273 V.

Topics & Concepts

DopingMaterials sciencePhysicsAnalytical Chemistry (journal)OptoelectronicsChemistryOrganic chemistryGaN-based semiconductor devices and materialsGa2O3 and related materialsZnO doping and properties
Effects of p-GaN Body Doping Concentration on the ON-State Performance of Vertical GaN Trench MOSFETs | Litcius