Advances in metal-based photoresist materials for EUV lithography and lithographic mechanisms
Yalong Wang, Haojie Yu, Li Wang, Yanhui Zhang, Zheyi Zhu, Ying Zhang, Ying Lu, Chenguang Ouyang
Abstract
With the rapid development of the IC industry, lithography, as a key step in IC manufacturing, is facing challenges in various aspects, such as the light source, photomask and photoresist.
Topics & Concepts
Extreme ultraviolet lithographyLithographyPhotoresistMaterials scienceX-ray lithographyNanotechnologyNext-generation lithographyComputational lithographyMultiple patterningResistPhotolithographyOptoelectronicsElectron-beam lithographyLayer (electronics)Advancements in Photolithography Techniques3D IC and TSV technologiesCopper Interconnects and Reliability