Overscreening Induced by Ionic Adsorption at the Ionic Liquid/Electrode Interface Detected Using Neutron Reflectometry with a Rational Material Design
Naoya Nishi, Junya Uchiyashiki, T. Oda, Masahiro Hino, Norifumi L. Yamada
Abstract
Abstract Neutron reflectometry (NR) has been utilized to study the electric double layer (EDL) of ionic liquids (ILs), however, further improvement of the sensitivity toward interfacial structure would be desirable. We recently proposed two ways to improve the NR sensitivity toward the EDL structure at the IL/electrode interface (J. Phys. Chem. C, 123 (2019) 9223). First, as the electrode, a thin film of metal (Nb) was used with the scattering length density (SLD) and thickness controlled to sensitively analyze the potential dependent EDL structure. Second, the IL cation and anion were chosen so that they have large size and large SLD difference, both of which also increase the sensitivity. In the present study, we have further explored this rational material design for the sensitivity enhancement, by changing the film metal from Nb to Bi whose SLD is closer to those for two bulk materials: Si and the IL used, trihexyltetradecylphosphonium bis(nonafluorobutanesulfonyl)amide. We successfully observed not only the first ionic layer in the EDL but also the overlayers, revealing that the IL cation is specifically adsorbed on the electrode and that the cation-rich first layer induces overscreening in the overlayers up to the third ionic layer.